MEMTEK, LLC

The High Reliability Embedded Non-Volatile Memory Company

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DOUBLE POLY-SINGLE METAL CELL ( Double Poly-Two metal cell will be smaller by 10 to 15%)	THE CELL- TECHNICAL ADVANTAGES Reduced Field on Floating gate due to two sided select gate spacing the diffusion away from FG edge Integrated Select/Control gate allow cells to be in depletion- No Over Program or Over Erase issues and no Vt distribution issues Use of total FG area for Program/Erase reduce stress on tunnel oxide Array configurable as EEPROM or Flash Disturbs have been designed out CELL_COST ADVANTAGES Standard Processing with minimum additional masks -4 to 5 for cell in 0.25 microns Processing of NVM prior to the CMOS and Analogprocess steps ensure minimum impact on standard device characteristics Standard Processing for low cost manufacture Read about the cell and Technology
THE ADVANTAGES MAKE THE CELL APPLICABLE IN: o... Automotive - High reliability, high temperature range (-40 to 125C or -55 to 150C) operation o... Medical - Very High reliability application o... Industrial - High reliability, high temperature and low cost application o... Consumer - low cost large volume application	PROGRAM/ERASE OVER WIDE TEMPERATURE RANGE
CELL SIZE SCALING	SCALING WITH TECHNOLOGY: o... Problem for most enbedded Non-Volatile memories due to- . .a)need for minimum number of additional steps . .b)high voltages required . .c)punch trough problems o... SimpleEE on the other hand scales well with technology with minimum change in process, lower high voltage needs and no punch through effects.
64K TEST ARRAY